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SOLEIL_NANOSCOPIUM InstrumentThe beamline NANOSCOPIUM works at photon energies between 5 and 50 keV. It is dedicated to full-field radiography and tomography in absorption and phase contrast, with pixel sizes from 20 nm to 20 µm. List of beamline elements. Distances are given from the center of the undulator. Position (m) | Element -------------|--------------------------------------------- 0 | Undulator (source) 18.109 | Primary slits 22.655 | Mirror M1 (curved) : horizontal deviation, vertical focus 24.471 | Mirror M2 (curved) : horizontal deviation, horizontal focus 75.758 | Secondary slits 77.224 | Monochromator (DCM) 82.064 | Slits Secondary source 148.893 | Slits JJ XRay 1 (entry Nanoprobe 1) (doesn't work) 150.721 | Nano-probe 1 (doesn't work) 154.353 | Slits JJ XRay 2 (entry Nanoprobe 2) 154.856 | Mirror KB1 (elliptic) : vertical focus 154.961 | Mirror KB2 (elliptic) : horizontal focus 155.140 | Nano-probe 2
| Name | Unit | Description | Default |
| NANO_E0 | keV | Energy selected at the Undulator. | 11 |
| NANO_dE | keV | Energy spread at the Undulator. | 1 |
| NANO_Emono | keV | Energy to be selected by the monochromator, or E0 when unset. | 0 |
| NANO_coating_m2 | 1 | 2 stripes on M2 : Rh (coated : 1) or Si (uncoated : 0) | 1 |
| NANO_angle_m1_m2 | rad | Incidence angle on M1 and M2 mirrors | 2.5e-3 |
| NANO_angle_kb1 | rad | Incidence angle on the first KB mirror (vertical focus) | 3e-3 |
| NANO_angle_kb2 | rad | Incidence angle on the second KB mirror (horizontal focus) | 2.5e-3 |
SOLEIL_NANOSCOPIUM.instr.
[ Identification | Description | Examples | Input parameters | Links ]
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